New center for semiconductor research opened in Dresden, Germany

A flagship of semiconductor research with international reach is emerging in Dresden. Fraunhofer IPMS and Fraunhofer IZM-ASSID are bundling their competences and establishing the Center for Advanced CMOS & Heterointegration Saxony. The center will offer the complete value chain in 300 mm microelectronics, a prerequisite for high-tech research for future technologies.

Unique research facilities in Germany in the field of microelectronics 

With Fraunhofer IZM-ASSID and Fraunhofer IPMS’ Center Nanoelectronic Technologies CNT, two unique research facilities in Germany in the field of microelectronics are located in Saxony. Today, they are the only two German research centers for applied microelectronics research based on 300 mm wafer industry standard equipment. With the bundling of competences and the foundation of the Center for Advanced CMOS & Heterointegration Saxony, excellent perspectives arise to attract semiconductor companies and system users as well as material and equipment manufacturers worldwide. In addition to excellent personnel and know-how, equipment with a modern equipment and plant park is crucial for industrial and research contracts.

With an investment volume of about €140 million in clean room facilities, Fraunhofer IPMS is uniquely positioned in Germany in the field of applied research on the modern 300 mm wafer industry standard in the front end of CMOS manufacturing. Fraunhofer IZM-ASSID complements this expertise with innovative packaging and system integration technologies. In the future, the center will be headed by Dr. Wenke Weinreich, division manager at CNT and deputy institute director of Fraunhofer IPMS, and Dr. Manuela Junghähnel, site manager at IZM-ASSID.