SENTECH sells equipment for plasma process technology (etching/coating equipment, ALD, ALE) and measuring equipment for optical thin film metrology (ellipsometers and reflectometers)
Plasma Process Technology:ICP etching system for low damage etching, RIE etching system, ICPECVD system for low damage coating, ALD and ALE systems. All equipment can be integrated into one cluster.
Optical thin film metrology:SENresearch 4.0 with wide spectral range from 190 - 3,500 nm, SENDIRA MIR spectroscopic ellipsometer, SENDURO MEMS an automated measurement platform, laser ellipsometer and others.